负责客户现场光刻工艺的技术支持，包括工艺开发、优化、参数设定与问题诊断；Provide on-site technical support for lithography processes, including process development, optimization, parameter setup, and issue diagnosis.

深入理解客户产品与制程需求，提供定制化的光刻解决方案；Deeply understand customer products and process requirements to deliver customized lithography solutions.

分析并解决光刻过程中出现的工艺问题，如曝光均匀性、对准精度、CD控制、Overlay误差等；Analyze and resolve lithography-related process issues such as exposure uniformity, alignment accuracy, CD control, and overlay errors.

协助客户进行新产品导入（NPI）过程中的光刻工艺验证与调试；Support customers in lithography process verification and tuning during new product introduction (NPI).

编写并维护技术文档，包括工艺流程、问题分析报告、技术交流材料等；Prepare and maintain technical documentation, including process flows, issue analysis reports, and technical communication materials.

与总部研发、产品、FAE团队协作，推动工艺技术的持续优化与创新；Collaborate with headquarters R&D, produ...